Like sandblasting at the nanometer scale, focused beams of ions ablate hard materials to form intricate three-dimensional patterns. The beams can create tiny features in the lateral dimensions—length ...
MOORESTOWN, N.J., Feb. 10, 2023 /PRNewswire/ -- Denton Vacuum LLC announced today that they have won a third order for the Infinity FA failure analysis system from a leading global semiconductor ...
Copper’s resistivity depends on its crystal structure, void volume, grain boundaries and material interface mismatch, which becomes more significant at smaller scales. The formation of copper (Cu) ...
After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...
BANGALORE, India, Jan. 6, 2026 /PRNewswire/ -- The Global Semiconductor Etch Equipment Market revenue was USD 22730 Million in 2022 and is forecast to a readjusted size of USD 49330 Million by 2029 ...
Ion beam lithography is used to create fine nanostructures on a surface, such as circuit boards. It can be used to directly write on the material, rather than using a photomask, as in photolithography ...
An example of directional etching for nanohole arrays of less than 500nm in diameter. (Image: A*STAR Institute of Materials Research and Engineering) Wet etching can be classified into two main types ...
Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The Helios 5 Hydra DualBeam (plasma ...
AZoMaterials interviews Matt Wilding about how the EP-Replayer enables users to simulate previous etch runs in real time, helping them optimize End Point detection methods, and more. Can you start by ...
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